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MOSIS
MOSIS是为超大规模集成电路的发展提供一种低成本的试样和小批量生产服务的组织。自1981年以来，MOSIS 在世界各地为商业公司、政府机构、研究和教育机构制造了超过50,000个电路设计。
IBM Fabrication
Technology descriptions, MPW fabrication schedule, and vendor document access procedures for the IBM fabrication processes available through MOSIS.
The IBM fabrication processes available through MOSIS range from 32 nanometer to 0.25 µm in CMOS, and from 0.13 µm to 0.50 µm in SiGe BiCMOS.
MOSIS offers a multiproject wafer (MPW) run schedule through IBM. To be considered ontime for an MPW run, layout and paperwork are due to MOSIS by 1 PM PT (Pacific/California Time) on the date listed.
MOSIS offers taxi runs for IBM processes, including some not available on shared multi-project wafer runs.
IBM design kits are available upon approval for MOSIS customers.
General instructions for accessing IBM design rules and cell libraries through MOSIS.
International Traffic in Arms Regulations (ITAR)
All IBM processes offered through MOSIS support designs subject to export control under ITAR regulations.